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IR3312 BTA04T X55C2V7 00BZI 00BZI 1V0DS00 74AC3 EPA3592G
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  Datasheet File OCR Text:
  geometry process details principal device types cedm7001 cmndm7001 gross die per 6 inch wafer 123,000 process CP361R small signal mosfet n-channel enhancement-mode mosfet chip die size 14.2 x 14.2 mils die thickness 3.9 mils gate bonding pad area 3.94 x 3.94 mils source bonding pad area 3.94 x 7.08 mils top side metalization al-si - 30,000? back side metalization au - 12,000? www.centralsemi.com r1 (2-september 2010)
process CP361R typical electrical characteristics www.centralsemi.com r1 (2-september 2010)


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